System Features

• The EPM micro-marking system is a high-performance system based on a 193nm excimer laser
• Mainly composed of a 193nm deep ultraviolet excimer laser light source, optical transmission system, and precision positioning system
• Features include short laser wavelength, short pulse width, high peak power, and high energy density
• Particularly suitable for high-precision micro-marking applications on surfaces of organic materials, glass, ceramics, and other materials
• Desktop placement, with selectable 193nm/248nm wavelengths
• Software customizable for fabricating microchannels, micropores, and other features

Technical Parameters

Specifications