Pulsed laser deposition (PLD) is a method in which a laser is focused onto a small area of a target material, utilizing the high energy density of the laser to evaporate or even ionize part of the target material, allowing it to detach from the target and move toward the substrate, where it deposits to form a thin film. Among the many thin film preparation methods, pulsed laser deposition technology is widely applied and can be used to prepare thin films of various materials such as metals, semiconductors, oxides, nitrides, carbides, borides, silicides, sulfides, and fluorides, and even to prepare films of some materials that are difficult to synthesize, such as diamond and cubic nitride films.

Pulsed laser deposition system (PLD): Recommended light sources include our PLD20, PLD30, and PLD20L excimer lasers, and the vacuum chamber can be selected from Shenyang Keyi PLD450 or LMBE450 models, among others. This system solution offers exceptional cost-effectiveness, is fully domestically produced, and meets the requirements for the preparation and research of most material thin films.

Attachment: Research papers published by university professors (using pulsed laser deposition systems configured with Shengfang Technology PLD excimer laser series)