PLD20, PLD30 excimer lasers

Maximum single pulse energy up to 650/500mJ

PLD20L excimer laser

Maximum single-pulse energy up to 800mJ

PLD50L excimer laser

Maximum single-pulse energy up to 800mJ

PLD100 excimer laser

Maximum single-pulse energy up to 200mJ, maximum repetition rate 100Hz.

PLD100L Excimer Laser

Pulse energy up to 400mJ, maximum repetition rate 100Hz.

FBG200 excimer laser

Repetition frequency adjustable from 1 to 200Hz.

FBG200L excimer laser

Repetition frequency adjustable from 1 to 200Hz.

FBG200G excimer laser

Repetition frequency adjustable from 1 to 200Hz.

FBG500 excimer laser

Repetition frequency adjustable from 1 to 500Hz.

FBG1kHz excimer laser

Repetition frequency 1 - 1000Hz adjustable

308nm skin therapy device

Excimer laser annealing system

System Overview The excimer laser annealing system uses an excimer laser as the light source, and after beam homogenization and shaping, it obtains an extremely uniform high-energy-density line-shaped laser beam, enabling uniform scanning of large-area samples; The excimer laser annealing system outputs a short wavelength with high photon energy and small sample absorption depth, primarily used for annealing or modification research of thin film materials, such as low-temperature polycrystalline silicon thin film annealing and development of optoelectronic functional thin film materials.