Pulsed laser deposition (PLD) is a method in which a laser is focused onto a small area of a target material, and the high energy density of the laser is used to evaporate or even ionize part of the target material, causing it to detach from the target and move toward the substrate, where it deposits to form a thin film. Among the many thin film preparation methods, pulsed laser deposition technology is widely applied and can be used to prepare thin films of various materials such as metals, semiconductors, oxides, nitrides, carbides, borides, silicides, sulfides, and fluorides, and even to prepare some materials that are difficult to synthesize, such as diamond and cubic...

The excimer laser annealing system uses an excimer laser as the light source, and after beam homogenization and shaping, it produces an extremely uniform, high-energy-density line-shaped laser beam, enabling uniform scanning of large-area samples. The excimer laser annealing system outputs a short wavelength with high photon energy and a small sample absorption depth, making it primarily suitable for annealing or modification studies of thin-film materials, such as low-temperature polycrystalline silicon thin-film annealing and the development of optoelectronic functional thin-film materials. System features: line-scan beam for uniform processing of large-area samples; multi-stage lens array homogenization technology for excellent beam uniformity; laser wavelengths selectable at 308nm, 248nm, 351nm, and 193nm; customizable line beam size...

Excimer lasers are currently the most suitable light source for fabricating fiber Bragg gratings. They provide two effective writing wavelengths, 193nm and 248nm, and have high single-pulse energy, allowing writing on fiber gratings with weaker photosensitivity and enabling online fabrication of fiber Bragg gratings. The main grating formation methods currently include: excimer laser interference, single-pulse writing of fiber gratings, and the phase mask method. The FBG series excimer lasers produced by our company can be applied in the production of fiber Bragg grating inscription, with the following advantages: 1. Uniform beam distribution, stable performance, and high cost-effectiveness. 2. Easy maintenance, low cost, fast response, and guaranteed after-sales service.

System Overview Laser ablation is an important technique for micro-area analysis and a key development direction for in-situ micro-area trace element and isotope analysis. The LA-193 excimer laser ablation system offers exceptional cost-effectiveness, with the laser fully localized in production, and its software and hardware support direct coupling with inductively coupled plasma mass spectrometers and spectrometers. The 193nm excimer laser belongs to the deep ultraviolet "cold laser" range, and its high-energy-density, uniform flat-top laser beam can ablate various samples, including transparent materials such as high-purity quartz and fluorite. System Features Energy density up to 30J/cm², capable of ablating samples like quartz and fluorite, with uniform laser beam energy distribution...

System Overview Laser ablation is an important technique for micro-area analysis and a key development direction for in-situ micro-area trace element and isotope analysis. The LA-193 excimer laser ablation system offers exceptional cost-effectiveness, with the laser fully domestically produced, and its software and hardware support direct integration with inductively coupled plasma mass spectrometers and spectrometers. The 193nm excimer laser belongs to the deep ultraviolet "cold laser" range, and its high-energy-density uniform flat-top laser beam can ablate various samples, including transparent materials such as high-purity quartz and fluorite. System Features Energy density up to 30J/cm², capable of ablating samples like quartz and fluorite, with uniform laser beam energy distribution...

System FeaturesThe EPM micro-marking system is a high-performance system based on a 193nm excimer laser, mainly composed of a 193nm deep ultraviolet excimer laser light source, an optical transmission system, and a precision positioning system. It features a short operating laser wavelength, short pulse width, high peak power, and high energy density, making it particularly suitable for high-precision micro-marking applications on surfaces of materials such as organics, glass, and ceramics. It is desktop-placed and offers selectable 193nm/248nm wavelengths, with software customization available for fabricating micro-channels, micro-holes, and similar features.Technical ParametersModelEPMLaser Wavelength193nmTypical Pulse Width~10nsMinimum Focused Spot Size30umEnergy Density>5J/cm2Working Range100mm*100mmPositioning Accuracy...