System Overview
The excimer laser annealing system uses an excimer laser as the light source. After beam homogenization and shaping, it produces an extremely uniform high-energy-density line-shaped laser beam, enabling uniform scanning of large-area samples. The excimer laser annealing system outputs short wavelengths with high photon energy and shallow absorption depth in samples, making it primarily suitable for annealing or modification research of thin film materials, such as low-temperature polycrystalline silicon thin film annealing and development of optoelectronic functional thin film materials.
System Features
Technical Specifications
| Model | ELA-308-100 | ELA-248-100 | ELA-248-50 |
| Laser Wavelength | 308nm | 248nm | 248nm |
| Laser Beam Size | 100mm×0.3mm | 100mm×0.4mm | 50mm×0.8mm |
| Maximum Laser Energy Density | 450 mJ/cm2 | 200 mJ/cm2 | 200 mJ/cm2 |
| Beam Uniformity | >92% | >92% | >92% |
| Scanning Step Accuracy | 5μm | 5μm | 5μm |
| Processing Atmosphere | N2/Air | N2/Air | N2/Air |
| Weight | 500Kg | 500Kg | 500Kg |
| Cooling Method | Air | Air | Air |
| Dimensions (L×W×H) | 1600mm×1600mm×1400mm | 1800mm×900mm×1600mm | 1800mm×900mm×1600mm |
