Excimer laser systems and equipment

EPM excimer laser micro-marking system

EPM excimer laser micro-marking system

Product Features

System Features

  • The EPM micro-marking system is a high-performance system based on a 193nm excimer laser
  • Mainly composed of a 193nm deep ultraviolet excimer laser light source, optical transmission system, and precision positioning system
  • Features include short laser wavelength, short pulse width, high peak power, and high energy density
  • Particularly suitable for high-precision micro-marking applications on surfaces of materials such as organics, glass, and ceramics
  • Benchtop placement, with selectable 193nm/248nm wavelengths
  • Software customizable for fabrication of microchannels, micropores, and more

Hardware specifications

Technical Parameters

ModelEPM
Laser Wavelength193nm
Typical Pulse Width~10ns
Focused Spot SizeMinimum 30um
Energy Density>5J/cm2
Working Range100mm*100mm
Position Accuracy5um


Specifications

 

Optional information

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