Product Features
System Features
- The EPM micro-marking system is a high-performance system based on a 193nm excimer laser
- Mainly composed of a 193nm deep ultraviolet excimer laser light source, optical transmission system, and precision positioning system
- Features include short laser wavelength, short pulse width, high peak power, and high energy density
- Particularly suitable for high-precision micro-marking applications on surfaces of materials such as organics, glass, and ceramics
- Benchtop placement, with selectable 193nm/248nm wavelengths
- Software customizable for fabrication of microchannels, micropores, and more
Hardware specifications
Technical Parameters
| Model | EPM |
| Laser Wavelength | 193nm |
| Typical Pulse Width | ~10ns |
| Focused Spot Size | Minimum 30um |
| Energy Density | >5J/cm2 |
| Working Range | 100mm*100mm |
| Position Accuracy | 5um |
Specifications
